Optical element for a EUV projection exposure system

US12406777B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Hartmut Enkisch · Aalen, DE
• Sandro Hoffmann · Aalen, DE
• Joern WEBER · Aalen, DE
• Sebastian Strobel · Aalen, DE
• Mirko Ribow · Oberkochen, DE
• Christoph Nottbohm · Bielefeld, DE
• Matthias Sturm · Waiblingen, DE
• Michael Krause · Ulm, DE

Key dates

• Filing date: Dec 22, 2022
• Grant date: Sep 2, 2025
• Expiry date: Mar 13, 2044

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/067
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In a method for producing an optical element for an EUV projection exposure apparatus, a shaping layer (221) is applied onto a substrate (20) so as to have a surface roughness of at most 0.5 nm rms directly after the application of the shaping layer onto the substrate.