System and method for process window optimization in a virtual semiconductor device fabrication environment
US12423486B2 · kind B2 · utility
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22Claims
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Key dates
| Filing date | May 8, 2020 |
| Grant date | Sep 23, 2025 |
| Priority date | — |
| Expiry date | May 30, 2042 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A virtual fabrication environment for semiconductor device fabrication that includes an analytics module for performing process window optimization is discussed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.