Systems and methods for determining a localized fluid velocity on a spinning substrate by tracking movement of a tracer across the spinning substrate
US12424467B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 16, 2023 |
| Grant date | Sep 23, 2025 |
| Priority date | — |
| Expiry date | Jul 23, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68764
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Systems and methods are provided to control operational parameter(s) of a spin-on process based on a localized fluid velocity of a processing liquid dispensed onto a surface of a spinning semiconductor substrate. In the present disclosure, a tracer is introduced within, or incorporated onto a surface of, a processing liquid as the processing liquid is dispensed onto the spinning semiconductor substrate. Movement of the tracer is tracked over time, as the tracer flows along with the processing liquid across the spinning substrate surface, to determine a localized fluid velocity of the processing liquid at one or more radial positions on the substrate surface. The localized fluid velocity is then used to control one or more operational parameters of a spin-on process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.