Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid
US12428737B2 · kind B2 · utility
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1References
13Claims
0Family size
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Key dates
| Filing date | Dec 7, 2022 |
| Grant date | Sep 30, 2025 |
| Priority date | — |
| Expiry date | Feb 16, 2044 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C18/1216
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A metal resist remover containing a solvent and a strong acid that is liquid at 20° C., in which a pH value, which is measured with a pH meter, of a liquid formed by subjecting the cleaning liquid to a 10-fold dilution with pure water is 2.5 or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.