Patent · US Expired

Process for simultaneous development and etch of photoresist and substrate

US3944421A · kind A · utility

10Cited by

4References

4Claims

0Family size

Assignee

Horizons Incorporated a division of Horizons Research Incorporated · US

Inventors

James M. Lewis · Aurora, US
Raymond Willis Newyear · Willoughby, US

Key dates

Filing date	Oct 3, 1973
Grant date	Mar 16, 1976
Priority date	—
Expiry date	Oct 3, 1993

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/32
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Photoresists are developed and the supporting substrate is etched simultaneously therewith by bringing the resist (after exposure) into physical contact with a fluid containing a developer for the resist and an etchant for the supporting substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.