James M. Lewis
15Patents
7h-index
12Co-inventors
59Inventor score
Filing activity: Oct 3, 1973 → Nov 18, 1988
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4931380A | Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist | Physics | 22 | Expired |
| US4526856A | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents | Physics | 17 | Expired |
| US4613561A | Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution | Physics | 15 | Expired |
| US4278753A | Plasma developable photoresist composition with polyvinyl formal binder | Emerging Cross-Sectional Technologies | 12 | Expired |
| US3944421A | Process for simultaneous development and etch of photoresist and substrate | Physics | 10 | Expired |
| US4710449A | High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants | Physics | 8 | Expired |
| US4661436A | Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant | Physics | 7 | Expired |
| US3954468A | Radiation process for producing colored photopolymer systems | Emerging Cross-Sectional Technologies | 6 | Expired |
| US4670372A | Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant | Physics | 6 | Expired |
| US4824769A | High contrast photoresist developer | Physics | 6 | Expired |
| US4033773A | Radiation produced colored photopolymer systems | Emerging Cross-Sectional Technologies | 6 | Expired |
| US4822722A | Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image | Physics | 4 | Expired |
| US4187105A | Photosensitive image forming composition containing at least one substituted bis-diaryl vinylidene compound and/or at least one substituted bis-diaryl imine compound | Physics | 4 | Expired |
| US4021242A | Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof | Emerging Cross-Sectional Technologies | 2 | Expired |
| USRE29748E | Dry working black image compositions comprising organic halogen compounds and ethylene compounds | General | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.