Method for preparing positive resist image
US3984582A · kind A · utility
27Cited by
2References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1975 |
| Grant date | Oct 5, 1976 |
| Priority date | — |
| Expiry date | Jun 30, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive resist image is produced by exposing, to radiation in a predetermined pattern, a polymeric material containing polymerized alkyl methacrylate units and polymerized monoethylenically unsaturated acid units. The exposed and unexposed areas are distinguished by their different respective abilities to be swelled in an appropriate swelling agent, and the swelled areas are removed by dispersal in a nonsolvent liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.