Soft X-ray mask alignment system
US3984680A · kind A · utility
18Cited by
5References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 14, 1975 |
| Grant date | Oct 5, 1976 |
| Priority date | — |
| Expiry date | Oct 14, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/167
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
An alignment system for aligning one or more soft X-ray lithographic masks with respect to a substrate to be exposed in a soft X-ray lithographic apparatus includes alignment marks on the masks and corresponding alignment marks on a substrate, and a means for detecting X-rays emitted from the alignment marks on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.