Modified processing of positive photoresists
US4007047A · kind A · utility
19Cited by
15References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 1975 |
| Grant date | Feb 8, 1977 |
| Priority date | — |
| Expiry date | Dec 10, 1995 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Positive photoresist layers including a base soluble resin and a diazo ketone sensitizer are treated with hydrogen ion following initial exposure to achieve changes in the developed resist profile and/or development in a negative mode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.