Leon H. Kaplan
9Patents
7h-index
5Co-inventors
56Inventor score
Filing activity: Jan 15, 1975 → Dec 8, 1995
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4307178A | Plasma develoment of resists | Physics | 22 | Expired |
| US4259430A | Photoresist O-quinone diazide containing composition and resist mask formation process | Physics | 21 | Expired |
| US4007047A | Modified processing of positive photoresists | Physics | 19 | Expired |
| US5254202A | Fabrication of laser ablation masks by wet etching | Emerging Cross-Sectional Technologies | 18 | Expired |
| US4036644A | Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor | Physics | 14 | Expired |
| US4414314A | Resolution in optical lithography | Physics | 11 | Expired |
| US5573875A | Laser ablation mask and method of fabrication | Emerging Cross-Sectional Technologies | 8 | Expired |
| US4497891A | Dry-developed, negative working electron resist system | Physics | 3 | Expired |
| UST973008I4 | Method for removing layers of organic material | General | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.