Alignment system and method with micromovement stage
US4019109A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 1976 |
| Grant date | Apr 19, 1977 |
| Priority date | — |
| Expiry date | Apr 5, 1996 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23Q1/36
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Alignment of a mask and a semiconductor wafer to be processed is effected by orthogonal and angular movements of the mask singly and in combination. A carrier for the mask is supported on four orthogonally positioned transducers which, when actuated to elongate or contract, produce carrier translational movement in either or both orthogonal directions and/or rotational movement by selective elongation and contraction of one or more transducers. Actuation of the transducers and the alignment are obtained by signals from a feedback system including photon detection and multiple frequency oscillation utilizing alignment marks on the mask and the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.