John H. McCoy
11Patents
9h-index
11Co-inventors
69Inventor score
Filing activity: Apr 5, 1976 → Mar 16, 2000
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6014200A | High throughput electron beam lithography system | Electricity | 88 | Expired |
| US4019109A | Alignment system and method with micromovement stage | Performing Operations; Transporting | 58 | Expired |
| US5437946A | Multiple reticle stitching for scanning exposure system | Physics | 42 | Expired |
| US5777729A | Wafer inspection method and apparatus using diffracted light | Physics | 41 | Expired |
| US5648854A | Alignment system with large area search for wafer edge and global marks | Physics | 40 | Expired |
| US6376329B1 | Semiconductor wafer alignment using backside illumination | Physics | 34 | Expired |
| US4085329A | Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment | Physics | 24 | Expired |
| US5838450A | Direct reticle to wafer alignment using fluorescence for integrated circuit lithography | Physics | 16 | Expired |
| US5741614A | Atomic force microscope measurement process for dense photoresist patterns | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6316164A | Proximity effect correction method through uniform removal of fraction of interior pixels | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5936254A | Thin film detection method and apparatus | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.