Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof
US4021242A · kind A · utility
2Cited by
7References
18Claims
0Family size
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Inventors
Key dates
| Filing date | Aug 15, 1975 |
| Grant date | May 3, 1977 |
| Priority date | — |
| Expiry date | Aug 15, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/109
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carbazole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.