X-ray lithography mask
US4035522A · kind A · utility
26Cited by
3References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 6, 1976 |
| Grant date | Jul 12, 1977 |
| Priority date | — |
| Expiry date | Apr 6, 1996 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An X-ray mask for variable resist exposure for use with X-ray lithography so that multi-level devices, using a single exposure of X-rays, can be made.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.