Apparatus for monitoring vacuum deposition processes
US4036167A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 30, 1976 |
| Grant date | Jul 19, 1977 |
| Priority date | — |
| Expiry date | Jan 30, 1996 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/544
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus is disclosed for utilizing a low energy electron beam to permit monitoring the rate of deposition and composition of the evaporant particles in a vacuum deposition system. This is accomplished by passing a sample of the evaporant employed in the vacuum deposition process through an enclosure defining a flow path for the evaporant sample which crosses the path of a relatively low energy electron beam which is sufficient to excite the electrons of the atoms constituting the vaporized particles in the deposition chamber. The outer-shell electrons of the atoms constituting the evaporant, after excitation, drop back to a lower energy state in the course of which photons are released which are characteristic of given materials. The enclosure is formed with an optical opening receiving the photons in a path orthogonal with respect to the excitation beam and evaporant sample path, and a photodetector is optically coupled to the opening for sensing the emitted photons. A filter or monochromator is used to select a specific emission line. The resulting electrical signal produced by the photodetector is employed either to provide a readout of the signal detected and/or to actuate co…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.