Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
US4036644A · kind A · utility
14Cited by
13References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 15, 1975 |
| Grant date | Jul 19, 1977 |
| Priority date | — |
| Expiry date | Jan 15, 1995 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Carboxylic acids are included in resists to increase their speed and adhesion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.