Patent · US Expired

Process for the removal of specific crystal structure defects from semiconductor discs and the product thereof

US4042419A · kind A · utility

15Cited by

5References

7Claims

0Family size

Assignee

Wacker-Chemitronic Gesellschaft fur Elektronik Grundstoffe mbH · DE

Inventors

Wolfgang Heinke
Helmut Kirschner · Munich, DE
Detlef Reimann

Key dates

Filing date	Jul 23, 1976
Grant date	Aug 16, 1977
Priority date	—
Expiry date	Jul 23, 1996

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S148/061
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Process of the removal of point defects and point defect agglomerates from emiconductor discs, which comprises the steps of providing one side of the discs with a mechanical stress field and then subjecting the discs to a heat treatment.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.