Hermetic topsealant coating and process for its formation
US4048356A · kind A · utility
18Cited by
11References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 1975 |
| Grant date | Sep 13, 1977 |
| Priority date | — |
| Expiry date | Dec 15, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31699
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A hermetic topsealant for metal electrodes on components and other microelectronic circuitry is formed by polymerizing a mixture of an unsaturated silane monomer, a bifunctional silane adhesion promoter, a polymeric plasticizer and a stabilizer. The purpose of this abstract is to enable the public and the Patent Office to rapidly determine the subject matter of the technical disclosure of the application. This abstract is neither intended to define the invention of the application nor is it intended to be limiting as to the scope thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.