Nitrogen-free anionic and non-ionic surfactants in a process for producing a haze-free semiconduct

US4070797A · kind A · utility

Assignee

• Wacker-Chemitronic Gesellschaft fur Elektronik Grundstoffe mbH · DE

Inventors

• Rudolf Griesshammer · Altötting, DE
• Helmut Kirschner · Munich, DE
• Gunther Lechner · Herrsching am Ammersee, DE

Key dates

• Filing date: Jul 2, 1976
• Grant date: Jan 31, 1978
• Expiry date: Jul 2, 1996

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/30625
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Process for making haze-free surfaces of semiconductor bodies which comprs a first step of polishing the surface by means of a polishing agent containing at least one member of the group consisting of quartz, silica, silicates and fluosilicates, and a second step of polishing the surface by means of a polishing agent containing in addition to the above defined agents from 0.1 to 10% by weight calculated on the polishing agent of a nitrogen-free surfactant selected from the group consisting of anionic and non-ionic surfactants, and a mixture thereof.