Novel resist spinning head
US4086870A · kind A · utility
42Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1977 |
| Grant date | May 2, 1978 |
| Priority date | — |
| Expiry date | Jun 30, 1997 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05C11/08
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A resist spinning head for preventing photoresist, or electron and X-ray resist from flowing to the edge of the wafer when spin coating in a photoresist spinner, which includes the use of a tapered top plate having a knife-edge contact to the surface of the wafer so as to seal the top of the wafer at an outer ring and prevent resist from flowing under the top plate; whereby the resist is guided, during spinning, by the tapered top surface to the edge of the plate and off the head. The tapered top plate is pressed against the wafer and secured by a spring biasing means to a spinner motor shaft.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.