Prebaking treatment for resist mask composition and mask making process using same
US4087569A · kind A · utility
17Cited by
5References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 20, 1976 |
| Grant date | May 2, 1978 |
| Priority date | — |
| Expiry date | Dec 20, 1996 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polymethyl methacrylate methacrylic acid (P[MMA/MAA]) copolymer powder is prebaked above 200.degree. C. The prebaked powder is dissolved in a suitable casting solvent. The insoluble material produced during prebaking is removed by filtration. Then the solution remaining is applied to a substrate, post-baked at a temperature less than or equal to the prebaking temperature to drive off the solvent, exposed to electron beam radiation, and developed in a developing solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.