On-the-fly photoresist exposure apparatus
US4095891A · kind A · utility
7Cited by
2References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 27, 1976 |
| Grant date | Jun 20, 1978 |
| Priority date | — |
| Expiry date | Dec 27, 1996 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/704
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for exposing photoresists "on-the-fly" is disclosed. The system incorporates a dye laser having an output pulse duration of less than about 250 nanoseconds to expose the photoresist while the photoresist is moving. Means are provided to synchronize the output of the laser to the motion of a photoresist coated surface and to insure spatial uniformity of energy across an object plane of an optical projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.