Apparatus for vacuum deposition
US4121537A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 21, 1977 |
| Grant date | Oct 24, 1978 |
| Priority date | — |
| Expiry date | Mar 21, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/546
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for vacuum deposition comprising a turn-table for holding substrates for deposition, and a plurality of evaporation boats arranged in opposition to a circumferential part of the turn-table, the turn-table being rotated at deposition whereby vapors from the respective boats can be cyclically accumulated and stuck onto the substrates, further comprises at least one film-thickness monitor which is fixed to the turn-table and which detects the quantity of a deposited substance of one layer stuck every time the substrates pass over each boat, and means to receive a signal from the film-thickness monitor and divide the signal time sequentially, thereby detecting at least one of the deposition rate and the total amount of the vapor from each boat, and to control the quantity of the vapor arriving to the substrates for deposition from each boat while comparing the detected value with a predetermined value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.