Method for fabricating multi-layer optical films
US4142958A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 1978 |
| Grant date | Mar 6, 1979 |
| Priority date | — |
| Expiry date | Apr 13, 1998 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3053
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for fabricating multiple layer interference optical films by ion beam sputtering, said films being used for mirrors in a ring laser apparatus. An ion beam strikes a target material obliquely, dislodging molecules of the target so that they can be deposited on a surface serving as a base for a multiple layer interference coating. The thickness of the coating is monitored so that the proper thickness of a given layer can be optimized to obtain the type of reflectance desired for a given light wave length. The surface to be coated is rotated during the deposition of the layer of target material. A stack of layers of alternating indices of refraction comprises the optical interference film. The coating process occurs inside of a vacuum chamber where the partial pressures of the gases are carefully controlled to insure the proper ion beam intensity and optimum stoichiometry of the deposited optical films. Prior to beginning the deposition of optical films, the ceramic substrate comprising the mirror base is bombarded by the ion beam at an oblique angle to remove surface anomalies and clean it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.