David Wei
20Patents
8h-index
31Co-inventors
75Inventor score
Filing activity: Apr 13, 1978 → Aug 7, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4142958A | Method for fabricating multi-layer optical films | Electricity | 47 | Expired |
| USRE32849E | Method for fabricating multi-layer optical films | General | 26 | Expired |
| US6190511A | Method and apparatus for ion beam sputter deposition of thin films | Physics | 22 | Expired |
| US6984892B2 | Semiconductor structure implementing low-K dielectric materials and supporting stubs | Electricity | 14 | Expired |
| US6896586B2 | Method and apparatus for heating polishing pad | Performing Operations; Transporting | 13 | Expired |
| US6808442B1 | Apparatus for removal/remaining thickness profile manipulation | Performing Operations; Transporting | 11 | Expired |
| US7892445B1 | Wafer electrical discharge control using argon free dechucking gas | Electricity | 10 | Active |
| US7307025B1 | Lag control | Electricity | 9 | Expired |
| US7425501B2 | Semiconductor structure implementing sacrificial material and methods for making and implementing the same | Electricity | 4 | Active |
| US6656024B1 | Method and apparatus for reducing compressed dry air usage during chemical mechanical planarization | Performing Operations; Transporting | 3 | Expired |
| US6719874B1 | Active retaining ring support | Performing Operations; Transporting | 3 | Expired |
| US6976906B2 | Apparatus for reducing compressed dry air usage during chemical mechanical planarization | Performing Operations; Transporting | 3 | Expired |
| US7789991B1 | Lag control | Electricity | 2 | Active |
| US6749491B1 | CMP belt stretch compensation apparatus and methods for using the same | Performing Operations; Transporting | 2 | Expired |
| US7297966B2 | Utilizing an integrated plasmon detector to measure a metal deposit roughness on a semiconductor surface | Physics | 1 | Expired |
| US6761626B2 | Air platen for leading edge and trailing edge control | Performing Operations; Transporting | 1 | Expired |
| US7495230B2 | Using a polaron interaction zone as an interface to integrate a plasmon layer and a semiconductor detector | Physics | 1 | Active |
| US7875548B2 | Method for making semiconductor structures implementing sacrificial material | Electricity | 1 | Active |
| US6878048B2 | CMP belt stretch compensation apparatus and methods for using the same | Performing Operations; Transporting | 0 | Expired |
| US7018276B2 | Air platen for leading edge and trailing edge control | Performing Operations; Transporting | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.