Electron sensitive resist and a method preparing the same
US4156745A · kind A · utility
26Cited by
0References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 3, 1978 |
| Grant date | May 29, 1979 |
| Priority date | — |
| Expiry date | Apr 3, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high speed high contrast electron resist composition comprising a copolymer of polymethylmethacrylate/methacrylic acid having incorporated therein a metal selected from the group consisting of lead, barium, calcium and strontium is disclosed. The metal is present in the range of from about 0.001% to about 10% by weight of the copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.