Method of manufacture of a soft-X-ray mask
US4170512A · kind A · utility
12Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 26, 1977 |
| Grant date | Oct 9, 1979 |
| Priority date | — |
| Expiry date | May 26, 1997 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for fabricating polyimide membrane x-ray lithography masks is described. Thin membrane of polyimide is formed by spinning polyamic acid on a glass substrate and polymerizing in situ. The glass substrate acts as a holder and efficient heat sink during formation of gold absorber patterns on top of the polyimide. A support ring is then bonded to the polyimide, and the glass etched in dilute HF. Optically smooth polyimide membranes with thicknesses from 0.5 to 5 .mu.m are readily achieved. The method and resulting product is not limited to the above materials or to masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.