Method and device for the projection printing of a mask onto a semiconductor substrate
US4215935A · kind A · utility
7Cited by
4References
4Claims
0Family size
Inventor
Key dates
| Filing date | May 24, 1979 |
| Grant date | Aug 5, 1980 |
| Priority date | — |
| Expiry date | May 24, 1999 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70575
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and device for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, said mask being illuminated by means of a light source and imaged on said workpiece by means of a projection lens, said workpiece being coated with a photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.