Method for detecting object picture by electron beam
US4219731A · kind A · utility
15Cited by
5References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1978 |
| Grant date | Aug 26, 1980 |
| Priority date | — |
| Expiry date | Nov 21, 1998 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/28
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method is disclosed in which an object picture such as an integrated circuit pattern is precisely and exactly detected at high speed by the use of an electron beam. At least two kinds of signals obtained by irradiating an object with an electron beam are detected and subjected to an adding/subtracting operation and a resulting signal is used to detect the object picture. Thus, a satisfactory S/N ratio can be obtained. The method is applicable to the inspection of a mask used for integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.