Supported membrane composite structure and its method of manufacture
US4254174A · kind A · utility
18Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1979 |
| Grant date | Mar 3, 1981 |
| Priority date | — |
| Expiry date | Mar 29, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for fabricating polyimide membrane x-ray lithography masks is described. Thin membrane of polyimide is formed by spinning polyamic acid on a glass substrate and polymerizing in situ. The glass substrate acts as a holder and efficient heat sink during formation of gold absorber patterns on top of the polyimide. A support ring is then bonded to the polyimide, and the glass etched in dilute HF. Optically smooth polyimide membranes with thickness from 0.5 to 5 .mu.m are readily achieved. The method and resulting product is not limited to the above materials or to masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.