Radiation-sensitive positive resist
US4259407A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 25, 1979 |
| Grant date | Mar 31, 1981 |
| Priority date | — |
| Expiry date | Jul 25, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/3154
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive positive resist which is prepared from a homogeneous polymer of any one of the various forms of halogenated alkyl .alpha.-halogenated acrylate expressed by the general structural formula: ##STR1## where: X = fluorine, chlorine or bromine PA1 R = alkyl group in which one or more hydrogen atoms are substituted by the corresponding number of fluorine atoms, or aryl group in which said substitution takes place, or alkoxy group in which said substitution takes place, or a copolymer of two or more of the monomers expressed by said general structural formula or a copolymer of any one of said monomers and any one of the different forms of vinyl monomer from those expressed by said general structural formula.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.