Mobile transparent window apparatus and method for photochemical vapor deposition
US4265932A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 2, 1979 |
| Grant date | May 5, 1981 |
| Priority date | — |
| Expiry date | Aug 2, 1999 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The specification discloses a mobile transparent window apparatus and method for use in a photochemical vapor deposition system having a reaction chamber with a quartz window integral with the top surface thereof, which prevents undesirable deposits on the quartz window and thereby enhances the efficiency and rate of the deposition process. The apparatus comprises: (a) a film of a predetermined material that is drawn across the internal face of the quartz window within the reaction chamber, the predetermined material being characterized by being transparent to a selected wavelength of radiation, being stable at the elevated temperature required for the photochemical vapor deposition, and possessing sufficient mechanical strength to be moved across the quartz window; and (b) means for moving the film across the internal face of the quartz window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.