Radiation mask for producing structural configurations in photo-sensitive resists by X-ray exposure
US4268563A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 25, 1979 |
| Grant date | May 19, 1981 |
| Priority date | — |
| Expiry date | May 25, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31623
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation mask having a masking structure and a carrier therefore, for the production of structural configurations in photosensitive resists by x-ray radiation, with the carrier having registration marks thereon, in which the carrier comprises a layer of approximately 3 to 10 .mu.m in thickness, which layer is formed of material penetratable both by x-rays and by radiation in the visible part of the spectrum, the carrier material preferably being polyimide resin or silicon dioxide produced thermally or by a sputtering technique. In a further embodiment the carrier may comprise a first layer of silicon dioxide and a second supporting layer of polyimide resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.