Apparatus and method for contact-free potential measurements of an electronic composition
US4277679A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 21, 1979 |
| Grant date | Jul 7, 1981 |
| Priority date | — |
| Expiry date | Dec 21, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/266
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for the contact-free potential measurement at an electronic component using an electron beam wherein a predetermined potential is applied to the measuring point and the output voltage of a controlled gain amplifier is set to a predetermined reference value U.sub.S by means of controlling a photomultiplier voltage U.sub.PM and the photomultiplier voltage U.sub.PM is maintained constant. The measuring voltage U.sub.M is then determined from the difference of the voltages U.sub.R -U.sub.S between the control unit output voltage U.sub.R and the index value voltage U.sub.S. The method and apparatus allow the quantitative potential measurement to be made on the conducting paths of an integrated circuit without utilizing manual adjustments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.