Patent · US Expired

Automatic wafer processing system and method

US4278366A · kind A · utility

28Cited by
6References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 18, 1977
Grant dateJul 14, 1981
Priority date
Expiry dateMar 18, 1997

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B35/005
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An automatic wafer processing system is modular in format and includes wafer treatment units, storage units and air bearing transport track units which are all of a common module size or an integral multiple thereof. All of these units can then be operatively interconnected in a coplanar configuration to provide an automated wafer flow path. Variation of treatment units can provide many different types of wafer processing in a simple and economical manner. To facilitate such automated system improved variable width air bearing tracks are provided along with a buffer storage unit to accommodate differing process times.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.