Plasma developable photoresist composition with polyvinyl formal binder
US4278753A · kind A · utility
12Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 25, 1980 |
| Grant date | Jul 14, 1981 |
| Priority date | — |
| Expiry date | Feb 25, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/126
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition useful as a photoresist which may be completely processed by dry techniques, especially by means of an oxygen plasma. The composition includes an N-vinylmonomer and an organic hydrogen compound in a binder which contributes significantly to the utility of the composition in the fabrication of micro-electronic devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.