Patent · US Expired

Method for the preparation of relief structures by phototechniques

US4287294A · kind A · utility

23Cited by

4References

6Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Roland Rubner · Königsee, DE
Eberhard Kuhn · Hemhofen, DE
Hellmut Ahne · Königsee, DE

Key dates

Filing date	May 9, 1980
Grant date	Sep 1, 1981
Priority date	—
Expiry date	May 9, 2000

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/12
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a method for making more efficient the preparation of relief structures by phototechniques from mixtures containing olefinically unsaturated polymers and azides as photo initiators. For this purpose, the invention provides the use of aromatic azidomaleinimides as photo initiators. The method according to the invention is suitable particularly for the structuring by phototechniques of insulating materials as well as of semiconductor and conductor materials.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.