Hellmut Ahne
61Patents
15h-index
29Co-inventors
80Inventor score
Filing activity: May 9, 1980 → Dec 10, 1997
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5234793A | Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development | Physics | 86 | Expired |
| US4339521A | Heat resistant positive resists containing polyoxazoles | Physics | 74 | Expired |
| US5173393A | Etch-resistant deep ultraviolet resist process having an aromatic treating step after development | Physics | 64 | Expired |
| US4395482A | Method for the preparation of heat-resistant relief structures using positive resists | Physics | 48 | Expired |
| US5250375A | Photostructuring process | Physics | 39 | Expired |
| US5376499A | Highly heat-resistant positive resists comprising end-capped hydroxypolyamides | Emerging Cross-Sectional Technologies | 34 | Expired |
| US4849051A | Heat resistant positive resists and method for preparing heat-resistant relief structures | Emerging Cross-Sectional Technologies | 34 | Expired |
| US4622285A | Method for manufacturing polyoxazole and polythiazole precursors | Electricity | 33 | Expired |
| US5234794A | Photostructuring method | Physics | 28 | Expired |
| US4311785A | Method for the preparation of highly heat-resistant relief structures and the use thereof | Emerging Cross-Sectional Technologies | 23 | Expired |
| US4287294A | Method for the preparation of relief structures by phototechniques | Emerging Cross-Sectional Technologies | 23 | Expired |
| US4371685A | Radiation-reactive precursor stages of highly heat-resistant polymers | Physics | 20 | Expired |
| US5556812A | Connection and build-up technique for multichip modules | Electricity | 19 | Expired |
| US5081000A | Photosensitive mixture | Emerging Cross-Sectional Technologies | 18 | Expired |
| US4965134A | Method for manufacturing highly heat-resistant dielectrics | Emerging Cross-Sectional Technologies | 17 | Expired |
| US4385165A | Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and polyquinazoline dione precursor stages and the manufacture | Chemistry; Metallurgy | 15 | Expired |
| US5384220A | Production of photolithographic structures | Emerging Cross-Sectional Technologies | 13 | Expired |
| US4329556A | N-Azidosulfonylaryl-maleinimides | Chemistry; Metallurgy | 13 | Expired |
| US4654415A | Method for the preparation of polyimide and polyisoindoloquinazoline dione precursors | Chemistry; Metallurgy | 12 | Expired |
| US4590103A | Method for the preparation of thin polyimide film | Chemistry; Metallurgy | 12 | Expired |
| US5973202A | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Physics | 10 | Expired |
| US4883730A | Method for manufacturing heat-stable structured layers based on expoxy resin | Emerging Cross-Sectional Technologies | 10 | Expired |
| US4975347A | Method for manufacturing heat-stable structured layers from photopolymers which are addition reaction products of olefinic unsaturated monoisocyanates and phenol-formaldehyde resins | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6110637A | Photoresists which are suitable for producing sub-micron size structures | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5922825A | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Physics | 9 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.