Patent · US Expired

Fluidized bed silicon deposition from silane

US4314525A · kind A · utility

44Cited by
2References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 3, 1980
Grant dateFeb 9, 1982
Priority date
Expiry dateMar 3, 2000

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B33/03
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process and apparatus for thermally decomposing silicon containing gas for deposition on fluidized nucleating silicon seed particles is disclosed. Silicon seed particles are produced in a secondary fluidized reactor by thermal decomposition of a silicon containing gas. The thermally produced silicon seed particles are then introduced into a primary fluidized bed reactor to form a fluidized bed. Silicon containing gas is introduced into the primary reactor where it is thermally decomposed and deposited on the fluidized silicon seed particles. Silicon seed particles having the desired amount of thermally decomposed silicon product thereon are removed from the primary fluidized reactor as ultra pure silicon product. An apparatus for carrying out this process is also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.