Apparatus for handling and treating wafers
US4315705A · kind A · utility
37Cited by
3References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 18, 1977 |
| Grant date | Feb 16, 1982 |
| Priority date | — |
| Expiry date | Mar 18, 1997 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K13/022
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A wafer processing system for spin processing photoresist liquid on a silicon wafer and automatically sequencing them through the processor includes a shuttle having upper and lower air bearing slides. The upper slide receives the wafer from a supply magazine and centers it on a rotating chuck and the lower slide of the shuttle receives the wafer from the chuck and allows it to be transferred to a receive track.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.