Enhancing epitaxy and preferred orientation
US4333792A · kind A · utility
23Cited by
4References
38Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 9, 1979 |
| Grant date | Jun 8, 1982 |
| Priority date | — |
| Expiry date | Apr 9, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S117/913
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An array of oriented artificial relief features or point defects embraced by parallel planes on a substrate surface influence the orientation of solid films during the course of their growth on the substrate surface. There may be multiple sets embraced in generally parallel planes at an angle to each other that is an integral multiple of 30.degree..
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.