Apparatus for writing patterns in a layer on a substrate by means of a beam of electrically charged particles
US4334139A · kind A · utility
20Cited by
4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 9, 1980 |
| Grant date | Jun 8, 1982 |
| Priority date | — |
| Expiry date | Jun 9, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3045
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus is described for writing patterns in a layer on a substrate by using a beam of electrically-charged particles. The apparatus is provided with an optical height-measuring system for determining a deviation between the desired and the actual position of the surface to be inscribed relative to the charged particle lens system. The deviation can be measured accurately and continuously without the use of additional markers on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.