Refractive index measurement of optical thin-film
US4335961A · kind A · utility
6Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 18, 1980 |
| Grant date | Jun 22, 1982 |
| Priority date | — |
| Expiry date | Apr 18, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0625
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method and apparatus for determining the refractive index of an optical film over a wide spectral range is described that involves measuring the changing radiant reflectance (or transmittance) of the film at various wavelengths as it is being deposited upon a substrate, as for example by vacuum deposition process. By determining the values of the extreme limits, an envelope of the peak reflectance can be developed from which the film's index of refraction is obtained over the entire spectral range that is situated between the two extreme wavelength channels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.