Ultra-violet lithographic resist composition and process
US4339522A · kind A · utility
26Cited by
7References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 1980 |
| Grant date | Jul 13, 1982 |
| Priority date | — |
| Expiry date | Oct 24, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0163
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.