Nicholas J. Clecak
9Patents
8h-index
24Co-inventors
65Inventor score
Filing activity: Mar 27, 1978 → Nov 28, 1994
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4397937A | Positive resist compositions | Physics | 36 | Expired |
| US5322765A | Dry developable photoresist compositions and method for use thereof | Physics | 31 | Expired |
| US4139276A | Electrochromic display devices comprising substituted fluorene compounds | Physics | 28 | Expired |
| US4339522A | Ultra-violet lithographic resist composition and process | Physics | 26 | Expired |
| US4284706A | Lithographic resist composition for a lift-off process | Physics | 18 | Expired |
| US4522911A | Deep ultra-violet lithographic resists with diazohomotetramic acid compounds | Physics | 16 | Expired |
| US6277546A | Process for imaging of photoresist | Physics | 14 | Expired |
| US4601969A | High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution | Physics | 11 | Expired |
| US4585310A | Alignment layer orientation in raster scan thermally addressed smectic liquid crystal displays | Physics | 5 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.