Process of exposing and developing terpolymer photosensitive bodies
US4343889A · kind A · utility
1Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 19, 1981 |
| Grant date | Aug 10, 1982 |
| Priority date | — |
| Expiry date | Feb 19, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.