Elsa Reichmanis
29Patents
12h-index
40Co-inventors
81Inventor score
Filing activity: Feb 19, 1981 → Apr 24, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5843624A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | Emerging Cross-Sectional Technologies | 163 | Expired |
| US6665127B2 | Method and apparatus for aligning a photo-tunable microlens | Physics | 98 | Expired |
| US5750312A | Process for fabricating a device | Emerging Cross-Sectional Technologies | 57 | Expired |
| US4996136A | Radiation sensitive materials and devices made therewith | Emerging Cross-Sectional Technologies | 37 | Expired |
| US4481049A | Bilevel resist | Emerging Cross-Sectional Technologies | 33 | Expired |
| US5135838A | Resist materials | Emerging Cross-Sectional Technologies | 23 | Expired |
| US4521274A | Bilevel resist | Emerging Cross-Sectional Technologies | 21 | Expired |
| US4373018A | Multiple exposure microlithography patterning method | Physics | 19 | Expired |
| US5879857A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5200544A | Resist materials | Physics | 15 | Expired |
| US4666820A | Photosensitive element comprising a substrate and an alkaline soluble mixture | Chemistry; Metallurgy | 13 | Expired |
| US4400461A | Process of making semiconductor devices using photosensitive bodies | Physics | 12 | Expired |
| US4701342A | Negative resist with oxygen plasma resistance | Physics | 11 | Expired |
| US7008757B2 | Patterned structures of high refractive index materials | Physics | 10 | Expired |
| US5741629A | Resist materials and related processes | Physics | 9 | Expired |
| US4551416A | Process for preparing semiconductors using photosensitive bodies | Physics | 8 | Expired |
| US5756266A | Process for manufacturing devices using maleimide containing resist polymers | Emerging Cross-Sectional Technologies | 4 | Expired |
| US7168266B2 | Process for making crystalline structures having interconnected pores and high refractive index contrasts | Chemistry; Metallurgy | 4 | Expired |
| US6852648B2 | Semiconductor device having a low dielectric constant dielectric material and process for its manufacture | Emerging Cross-Sectional Technologies | 2 | Expired |
| US4382120A | Photosensitive element containing UV sensitive terpolymers | Emerging Cross-Sectional Technologies | 2 | Expired |
| US4343889A | Process of exposing and developing terpolymer photosensitive bodies | Physics | 1 | Expired |
| US8603705B2 | Polymer film-producing methods and devices produced therefrom | Electricity | 1 | Active |
| US7309876B2 | Organic semiconductor having polymeric and nonpolymeric constituents | Electricity | 1 | Expired |
| US11699785B2 | Composite electrodes and methods of making the same | Emerging Cross-Sectional Technologies | 0 | Active |
| US12394788B2 | Composite electrodes and methods of making the same | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.