Photoresist composition
US4349619A · kind A · utility
29Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 10, 1980 |
| Grant date | Sep 14, 1982 |
| Priority date | — |
| Expiry date | Sep 10, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/901
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene polymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution and only a small number of pinholes can be obtained even when a base board having a surface of a high reflectance is used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.