Yoichi Kamoshida
10Patents
7h-index
26Co-inventors
62Inventor score
Filing activity: Apr 2, 1980 → Nov 15, 1994
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4499171A | Positive type photosensitive resin composition with at least two o-quinone diazides | Physics | 37 | Expired |
| US5019479A | Positive type radiation-sensitive resin composition comprising a photosensitizer and a novolak resin | Physics | 33 | Expired |
| US4349619A | Photoresist composition | Emerging Cross-Sectional Technologies | 29 | Expired |
| US5605962A | Flame retarding resin composition | Chemistry; Metallurgy | 26 | Expired |
| US4384037A | Positive type photosensitive resin composition | Emerging Cross-Sectional Technologies | 15 | Expired |
| US4407927A | Photoresist composition | Emerging Cross-Sectional Technologies | 13 | Expired |
| US4623609A | Process for forming patterns using ionizing radiation sensitive resist | Chemistry; Metallurgy | 7 | Expired |
| US5274053A | Process for producing thermoplastic resin | Chemistry; Metallurgy | 7 | Expired |
| US4294908A | Photoresist composition containing modified cyclized diene polymers | Physics | 5 | Expired |
| US5457167A | Polyorganosiloxane-type thermoplastic resin | Chemistry; Metallurgy | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.