Patent · US Expired

Automatic wafer processing system and method

US4352607A · kind A · utility

5Cited by
0References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 11, 1980
Grant dateOct 5, 1982
Priority date
Expiry dateDec 11, 2000

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B35/005
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An automatic wafer processing system is modular in format and includes wafer treatment units, storage units and air bearing transport track units which are all operatively interconnected in a coplanar configuration to provide an automated wafer flow path. To facilitate such automated system improved variable width air bearing tracks are provided by flexible strips in slots.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.